Molybdenum-Niobium (Mo-Nb) Sputtering Targets for Advanced Applications
Molybdenum-niobium (Mo-Nb) sputtering targets combine high melting points (>2600°C) and exceptional corrosion resistance, making them indispensable in semiconductor and aerospace industries. Key advantages include: Ultra-High Purity (≥99.95%): Critical for defect-free thin-film deposition in 5nm-node chip fabrication.
Thermal Stability: Maintain structural integrity at 1200°C, outperforming conventional pure Molybdenum targets in high-power plasma environments.
Semiconductor Manufacturing: Mo-Nb alloy’s low thermal expansion minimizes warping during extreme ultraviolet (EUV) lithography, enabling sub-7nm patterning precision34.
Renewable Energy Systems: Sputtered Mo-Nb back electrodes enhance perovskite cell durability in humid environments, achieving >23% PCE (Power Conversion Efficiency).
Aerospace Coatings: Plasma-sprayed Mo-Nb/Y₂O₃ coatings reduce turbine blade oxidation by 60% at 1500°C, extending engine service life.
Powder Metallurgy Optimization: HIP processing at 1700°C under 150MPa pressure eliminates microvoids, improving target density to 98.5% theoretical.
Surface Engineering Breakthroughs: Femtosecond laser patterning creates micro-cavity structures (10–50μm depth), boosting sputtering yield by 35%.
Mosten Alloy can produce molybdenum sheet, molybdenum block, molybdenum foil, molybdenum rod, molybdenum wire, molybdenum cup, molybdenum processing workpiece according to customer demand.
