Molybdenum alloy sputtering target
At present, including liquid crystal display TFT-LCD, plasma display PDP and touch screen TP and other flat panel display (FPD) has become the mainstream of the display, has been more and more applied to all aspects of our lives. The target material is an important raw material for vacuum coating. The purity and density of the target material directly affect the composition and comprehensive properties of the film system. In the past 20 to 30 years, with the rapid development of sputtering coating technology, new target preparation technology has been emerging, and the quality and performance of the target have also been significantly improved. According to the current technical conditions, the existing manufacturing methods of general coating targets include: hot isostatic pressing, sintering, extrusion and casting.
First of all, the powder is prepared: 3N5 metal molybdenum powder with low oxygen content and 4N metal niobium powder or tantalum powder with low oxygen content are mixed for granulation. In order to prevent oxidation during powder mixing, the inert gas argon is filled into the mixer for protection. Then, hydroforming: the prepared powder is loaded into the special mold of the hydraulic press and pressed into the required size. Then, cold isostatic pressing (CIP) molding, the hydraulic forming metal molybdenum niobium target body vacuum packaging into the cold isostatic press. Sintering, machining, the sintered molybdenum niobium target body 6 end faces are machined to ensure that each end face remains flat and smooth.
