Mosten Alloy Co., Ltd.

Leading Supplier of Molybdenum and Tungsten
High Quality & Reasonable Price & Best Service
Applications:
Semiconductor, Solar Energy,
Medical and Aerospace etc.

Product

Tungsten Target

  • Tungsten Target
  • Tungsten Sputtering Target
  • Tungsten Targets

The highest purity of tungsten target we produce can reach 99.97%. Density ranges from 18.8 to 19 g/cm3. It has homogenous structure and grain size. Due to its high melting point, plasticity, low expansion coefficient, resistivity and good thermal stability. Pure tungsten and tungsten alloy targets are widely used for semi-conductor integrated circuit, surface monitor, solar energy photovoltaic and X-ray. Tungsten target can be used with old sputtering equipment, also with the newest technical device such as solar energy battery, fuel battery and large scaled coating for chips.

Tungsten target is produced by sintering tungsten powder. Tungsten target is solid and its surface is bright. We can produce tungsten target as customers’ requirements. Metal tungsten has good ductility. So it can be used for cathode target in X ray tube. This tungsten target owns homogeneous, good thermal conductivity, high melting point, low vapor pressure. So it can be applied to glass, LCD screen, LED and electrical industry.


Tungsten Target

Tungsten target has homogeneous tissue structure and grain size, its density ranges from 18.8 to 19g/cm3. Because of its high melting point, plasticity, low expansion coefficient, resistivity and good thermal stability. Pure tungsten and tungsten alloy target are widely used for semi-conductor integrated circuit, surface monitor, solar energy photovoltaic and X ray. Tungsten target can be used with old sputtering equipment, also with the newest technical device such as solar energy battery, fuel battery and large scaled coating for chips.

Tungsten Sputtering Target

Tungsten sputtering target has adopted the best technique including X ray fluorescence (XRF), Glow discharge mass spectrometry (GDMS), inductively coupled plasma (ICP). A new way to make material of thin film is sputtering physical vapor deposition (PCD). The thin film made by sputtering material has high density and good adhesion. High purity of metals and alloy target are necessary for the widely used magnetron sputtering technology. We produce tungsten sputtering target as customers’ requirements.

If you would like to purchase tungsten target from China, please don't hesitate to Contact Us.